This lens is one of the core components in semiconductor detection. Composed of multiple optical elements, it is used to scale down and project the pattern on the photomask onto the silicon wafer. The design and manufacturing of the lithography machine objective constitute a complex system engineering involving technologies across optics, mechanics, electronics, software and other disciplines. On the basis of satisfying high exposure resolution, the lens can reduce the number of lenses and aspherical mirrors, cut down the design cost and manufacturing cycle of the lithographic projection objective, and enhance the product’s market competitiveness. Meanwhile, through alternating positive and negative focal power combinations, the aberration correction capability of the lithographic projection objective is improved, thereby boosting exposure imaging quality, achieving finer exposure resolution and CDU (Critical Dimension Uniformity), and ensuring imaging accuracy and stability.