Optical Lenses
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193nm Deep Ultraviolet (DUV) Laser Coatings
time :2026-04-18
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Optical Characteristics:
  • Fused Silica: T > 97% @ 193 nm; R > 98% @ 193 nm

  • CaF₂: T > 99% @ 193 nm; R > 97% @ 193 nm

Application Scenarios:
22nm lithography scanners, ArF excimer lasers, etc.
Technical Advantages:
In-house developed equipment; solved the critical issue of spectral performance degradation during long-term use, both theoretically and practically

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